Nanotechnology and Materials Technology

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Conte nts

Int roduction

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Orga ni za tion of T his Brochure

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• Na not echnology P rogram Na not echnology Gl ass Project ················································································· 1 Na not echnology Metal Project

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Adva nced Na nocarbon Appl ication Project

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Na not echnology P art icle Project

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Na nostruct ure Coa ting Project

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Synt het ic Na nofunct ion Ma terials Project Na not echnology Material Metrology Project

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Project on Na nostruct ured P olymeri c Materials

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Adv anced N anofabrication Process Technology U sing Quantum Be ams Full color Rewr itabl e Paper U sing Functional Capsules Project Nanostructure Forming f or Cer amics Integration Project

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R&D of 3D NanoScal e Certified Reference Materia ls Project

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Adv anced Dia mond Dev ice Project ··········································································· 25 Carbon N anotube FED Project

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Hi ghly Funct ional Nanotechnology Gla ss Project for Photonic Devices

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Hi gh- St rength Nanotechnology Gla ss Project for D ispla ys

• Innova tive Materials Devel opment Program Adva nced E valua tion Methods R esearch P roject for Na noscale S emiconduct ors ······················································································································· 33 Technologies • Program for F unda ment al Telecommunicat ions Equi pment and Devices Development of Phonic Network Technology

of

Adva nced

a nd

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Development of Hi ghly-C apacity Optical Storage Technology MEMS Project

Infor mation

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•Basic Technology Research Promotion Research on High-Resolution and High-Speed Composition Analysis of Nanometer-Thick Films Rugate Filters

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Development of Nanoparticle and Nano-Thin-Film Phosphors for FED Study of GaN on Si Power Devices

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Development of a Drug Delivery System Making Use of Biodegradable Nanocomposite Polymer Particles

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Development of Basic Technology for High Density Surface Mount Next-Generation Semiconductor Devices

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Advanced UV-B and C Optical Semiconductor Devices

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Development of Ultra-high-speed InP Epitaxial Crystal Manufacturing Technologies ······ 55 Functional Nanoprobes for Bioproperty Mapping

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Development of the World First Cathodluminescence and Raman Spectroscopic Systems Using a Near-field Spectroscopic Technique

Index of Key Words

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Introduction Nanotechnology is an advanced technology that has received a lot of attention for its ability to make use of the unique properties of nanosized materials. Nanotechnology is capable of manipulating and controlling material structures at the nano level (a nanometer is equal to one millionth of a millimeter) and offering unprecedented functions and excellent material properties. Nanotechnology consists of the “top-down approach” and the “bottom-up approach.” In the former approach, the sophistication of fine processing technologies, such as semiconductor manufacturing, can lead to the processing of nanosized fine structures. In the bottom-up approach, self-organization properties inherent in materials can be utilized to assemble nanosized fine structures from the atomic or moleculer levels. Nanotechnology, including nanostructured material metrology to accurately determine physical properties at the nanolevel, is considered a strategic technological area that goes beyond conventional technologies, potentially leading to a paradigm shift in new industrial technologies. The basic concept of nanotechnology first emerged half a century ago. Actual observation and manipulation of nanosized atoms became possible when scanning tunneling microscopes came into practical use in the first half of the 1980s. Since the United States launched its National Nanotechnology Initiative (NNI) in 2000 as a strategic governmental research program, global nanotechnology research and development investment has been on the rise. As stated in the “Science and Technology Basic Plan” (March 2001) and “Promotion Strategy of Prioritized Areas” (September 2001) of the Cabinet Office’s Council for Science and Technology Policy, Japan considers nanotechnology and nanomaterials to be key areas for the 21st century that will support a wide range of scientific and technological breakthroughs. Moreover, they are priority technologies essential to the sustainable development of economic society and enhancement of industrial competitiveness. Given their importance, the Japanese government has designated nanotechnology and materials as one of four priority areas for enhanced research and development over the next five years. NEDO, Japan's largest public R&D management organization for promoting advanced industrial technology development, has been carrying out various activities related to nanotechnology in recent years. Nanotechnology is indeed a key technology for innovative development in various industrial technologies, and it is expected to contribute to significant energy conservation and environmental burden reduction in the future. Because of this, NEDO allocated 16.3 billion yen to activities concerning nanotechnology and materials in its FY2005 R&D budget of 148.1 billion yen. This brochure describes NEDO’s research and development projects that involve the collaborative efforts of government, industry and academia in the area of nanotechnology as well as research and development support provided to private sector enterprises.

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Organization of This Brochure This brochure describes NEDO's projects in the area of research and development on nanotechnology. The projects are grouped into the four research and technology programs outlined below. Nanotechnology Program Controlling materials at the nano level can enhance material functions and characteristics, leading to considerable energy savings and environmental load reduction. Nanotechnology is a major advance capable of bringing extraordinary change to various industrial technologies, and thus the establishment of nanotechnology is vital. Knowledge gained from nanotechnology should be systematized to establish a technological base that can contribute to sustainable development of Japan's economy as a basic resource of industrial competitiveness. Innovative Materials Development Program The materials area is one of the strong points of Japanese industry. In this area, timely provision of solutions (commercialization of parts and products) can be achieved by manufacturing system technologies that shorten the lead time for production, and by technologies combining material development and fabrication technologies, making full use of material functions and properties. In this way, the program aims to establish high-value added material industries (a materials industry and a components industry) for creating new markets and jobs and to enhance the international competitiveness of Japanese industry. Program for Fundamental Technologies of Advanced Information and Telecommunications Equipment and Devices Research and development on information and telecommunication technologies will be conducted to develop information and telecommunications equipment and devices for constructing advanced communication networks. The program aims to create a more prosperous society while also considering environmental load reduction and standardization of technologies for promoting practical application and market dissemination.

Research and development program: A policy package of research and development projects that the Ministry of Economy, Trade and Industry considers essential to achieve strategic policy goals related to industrial technologies that are established by analyzing social needs, market trends and technology trends both in Japan and abroad.

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Research Phases Described in This Brochure

Applied Research

Development for Practical Application

Research and Development Projects Focus 21 projects* Basic Technology Research Promotion Activities (Solicitation of proposals for research themes)

*About “Focus 21” Some of the projects described in this brochure are “Focus 21” projects that emphasize development for practical application in order to stimulate the economy. Focus 21 projects must meet the following four conditions: 1. Technical innovation leading to enhanced competitiveness 2. Prospect of findings from research and development that will result in new products and/or services 3. Possibility of creating new markets in a relatively short period of time that will result in significant growth and economic ripple effects 4. Willingness and specific efforts by industry to provide funding for realizing commercial market introduction.

Basic Technology Research Promotion (Private Sector Basic Technology Research Promotion Activities) Unlike its research and development programs, NEDO’s basic technology research promotion activities involve the solicitation of proposals for research themes related to mining and manufacturing basic technology, and entrustment of actual research work to private sector enterprises that propose high risk but promising research themes. In Japan, private sector enterprises undertake most of the research and development activities. This brochure describes research themes related to nanotechnology that are representative of NEDO's basic technology research promotion.

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Commercialization

Basic Research

Nanotechnology Program

Nanotechnology Glass Project Keywords: Glass, Sub-wavelength structure, Telecommunications R&D Term: FY2001᳸FY2005ų

Budget of FY2005:410 million yen

Background This project aims to further increase the levels of these advantages. Japanese industry will䇭 extensively utilize the outcome obtained from this project and will cultivate new leading markets in the fields of optical communication, energy and environment. It will also contribute to international society.

ųThe Nanotechnology Glass Project is intended for the development of fundamental technologies for glasses with completely new functions by controlling structure on a nanometer scale. It is primarily known that glass is transparent, hard and stable thermally and chemically.

Organization Project Leader䇭 䇭Professor䇭K䋮HIRAO䇭Kyoto university Participating Organizations New Glass Forum National Institute of Advanced Industrial Science and Technology Prof .K. HIRAO

Contents Diffraction efficiency (-)

[Ძ] Telecommunications Ყ Storage Ყųųųųųųųųųųųų Precise fabrication technology for wavelengthlevel periodic structures on a glass surface is being developed using semiconductor microfabrication technology, including lithography and dry etching. For example, the etching rate of the glass could be vertically controlled by doping several additives, realizing fabrication of a rectangular periodic structure with a 200-nm grove width and an aspect ratio of 6. Furthermore, resistance against mechanical shock was remarkably improved by overcladding on the periodic structure. It was demonstrated that this technology was applicable to an ultrasmall demultiplexer on a glass plate of 6 x 9 mm. This project aims to construct the basic technology to fabricate optical memory heads, which will provide high angular dispersion for a so-called “super prism”. Concave mirror Arrayed waveguide Buried output grating Arrayed waveguide input

2mm

1.0

TM

TE 0.9 0.8

30o

TE

TM

0.7

calculated by RCWA

0.6 0.5 1.48

5µm 1.52

1.56

Wavelength (µm)

1.60 1.48

1.52

1.56

1.60

Wavelength (µm)

Diffraction efficiencies and cross sectional SEM views of diffraction gratings before (left) and after (right) overcladding

Also, a high recording density DVD that can record high definition TV images for 24 hours has been developed in this project. This research was transferred to the Focus 21 Project in order to accelerate R&D for practical application. Ყ CommunicationsᲧų ųųųųųųų Optical fiber networks have begun to spread instead of metal networks due to increased Internet traffic. There is a strong requirement of small and low-cost optical devices, which can be used even in a harsh environment. This project is developing new glasses for low-loss optical waveguides, athermal optics and micro-lens arrays. Also,

Ultra-small 4-channel demultiplexer designed to operate at around 1550-nm wavelength

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phosphor has continued for more than a half year, and its intensity is three times as high as that of the phosphors currently used. In the future, nano particles in glass will be employed for the display and lighting using UV-LED as an exiting light source.

femtosecond laser irradiation is being used for fabrication of optical waveguides, gratings, diffraction lenses and three dimensional periodic structures inside glass, which are key elements for three-dimensional optical circuits. ŒO

[Წ] Energy

ŒO ŒO

Beam profile

PL of Ag grating

ųA method to modify the inner wall of numerous through pores of 4-nm diameter in a glass with conductive organic molecules has been developed. Conductive organic-inorganic hybrid material developed by this method exhibits a conductivity of 10-1 S/cm at 140°C. This material is expected to be utilized as the membrane for a direct methanol fuel cell, which is attracting attention as a clean energy source. The project will continue to study the increase in degree of orientation of conductive paths in order to improve the conductivity.

Pattern shape

Micro pattern formation

3D optical circuit

Ძ᳧᳧

Examples of micro optical elements

Ყ DisplaysᲧųųųųųųųųųųųųųųųų New technology to improve the strength of glass is being studied in order to contribute to weight savings of flat panel displays. Crack propagation was suppressed by the formation of a heterogeneous phase inside glass by irradiation with a focused femtosecond laser beam, resulting in an increase of mechanical strength by 1.8 times. Further increases in strength are now being attempted. This process can be applicable to the strengthening of thinner glass plate, and it has an advantage over traditional heat-treatment and ion-exchange methods in the aspect of energy consumption. Crack

Photograph of Fracture

2 inch Conductivity䇭(S/cm)

1 Nafion® (RH=90%)

Hybrid glass (RH=100%)

0.1

0.01

0.001 30

Hybrid glass (RH=90%)

50

Nafion® (RH=100%)

70 90 110 130 Temperature (oC)

150

Image of Fracture Organic-inorganic hybrid membrane with high proton conductivity (left) and temperature dependencies of conductivities of membrane and Nafion (right)

Heterogeneous phase

[Ჭ] Environment ųSilica based “molecular sieving membranes” have been developed with 20% aligned pores, which could be fabricated by applying an electric field to SiO2-sol film dispersed with liquid crystal followed by the calcination of film to remove the organic components. These membranes can be used to separate CO2, which is a source of global warming, and H2 for next㵥generation fuel cells.

Crack propagation is suppressed by heterogeneous phase

Suppression of crack propagation by heterogeneous phase

Dispersion technology for size-controlled semiconductor nano particles in glass matrix has been developed without degradation of photoluminescence efficiency. An emission efficiency of more than 40% has already been achieved. At this time, the emission from this

Contact Information New Energy and Industrial Technology Development Organization Nanotechnology and Materials Technology Development Dept. Tel:+81-44 - 520-5220 New Glass Forum Tel :+81-3 -3595-2775

http://www7.big.or.jp/~cgi19786/ngf/indexe.html

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Nanotechnology Program

Nanotechnology Metal Project Keywords:Metal, High purity, Structure R&D Team:FY2001᳸FY2006 Budget of FY2005:300million yen

Background The objective of this project is to achieve dramatic improvement in the mechanical and functional characteristics of metal materials by controlling their composition and structure to ultra-dense and ultra-fine levels.

Project research on ultra-high purity metallic materials is based on controlling impurity concentration at the nano order level and on controlling structure at the nano size level.

Organization Project Leader Professor㩷 A. INOUE Tohoku university ᫊ϙჇ

Participating Organizations㩷

                    ᲢȋȤȃᲣ

Osaka Science & Technology Center.

Japan Research and Development Center for Metals㩷, Hitachi Metals, Ltd. Prof. A.INOUE

Contents and plasticity. In the case of 50%Cr alloy, there is no sigma phase precipitation, with high temperature properties and corrosion resistance that far surpass conventional expectations. Anticipated applications include high temperature materials in thermal power plants and chemical plants.

[1] Ultra High Purity Metals — Heat and Corrosion Resistant Materials Developed Using Nano metallurgy — Ultra high purification of metals such as iron (including alloys) is revealing new properties heretofore unknown. For example, iron that has been ultra-purified to above 99.999% hardly reacts at all with hydrochloric acid at room temperature. And, while industrial grade 99.9% pure iron suffers brittle fracture when subjected to deformation in liquid nitrogen (77K), ultra high purity iron exhibits good plastic deformation at cryogenic temperatures. For most metals, surprising properties become apparent when ultra-purified to a level of within 100ng of impurities per gram of metal. Laboratory research on ultra high purity metals has opened up the field of Nano metallurgy, underpinning the development of innovative new metallic materials that will be indispensable in the 21st century. Ultra high purity Cr-Fe alloys are an example of the results of research on Nano metallurgy. Although the corrosion resistance and strength of Cr-Fe alloys are increased with higher amounts of Cr, severe work-hardening and brittleness have imposed a practical limit of 30%Cr. In the case of ultra-purified 35%Cr alloy, however, absorption energy and strength are so high as to stop a hammer on a test piece during Charpy impact testing. This material also demonstrates extremely low susceptibility to stress corrosion cracking, as well as excellent corrosion resistance

(a)

Ultra high purity Fe-30Cr alloy

(b) SUS316

Stress corrosion fracture susceptibility test (U bend) (Test conditions: 300˚C, 8.7MPa, 10%NaOH bath x 100h)

Thermal power plants

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Chemical plants

[4] Nano Multistructure

㪜㫃㩷㩿㩼㪀

[2] High Strength Steel Using Cu Nano precipitation The aim of this fundamental research is to investigate leading principles for realizing high strength steel with excellent ductility. Improvement of mechanical properties of steel with precipitated Cu clusters of nanometer size is being investigated. With studies on thermomechanical treatment of Cu containing martensite steel supported by computing science, an excellent level of the strength/ductility balance index, TSxEl, as high as 17000 MPa᳽% has been realized. 㪈㪍 㪈㪌 㪈㪋 㪈㪊 Aged at 450㷄 㪈㪉 㪈㪈 㪈㪇 㪐 0%Cu Steel 㪏 JIS13B, 2.7䌾3mmt 㪎 (12.5mm w x 50mm G.L.) 㪍 㪏㪇㪇 㪈㪇㪇㪇

To promote efficiency in time and money consuming material development, the goal of this research is to establish a technique for controlling structure with nano clusters and to provide nano structure simulation software to researchers. Thus far, an analysis of the nuclear creation phenomena of early stage alloy structure creation and the composition analysis of material properties have been made. A simulation of the width of a precipitation free zone has also been undertake.

Aged at 450㷄 TS x El

17000

4%Cu Steel Aged at 250䌾350㷄

15000 13000 11000

Aged at 250䌾350㷄

㪈㪉㪇㪇

㪈㪋㪇㪇

㪫 㪪 㩷㩿㪤 㪧㪸㪀

[5] Ultra Tool Steels Tool steels are important materials for the automobile industry and the information technology industry to produce various parts. In particular, excellent properties that the conventional steels cannot achieve have been required for the hot working tool steels, as the hot working techniques progress.  The objective of this research is to achieve dramatic improvement in the mechanical characteristics of metal materials by controlling their composition and structure to ultra-dense and ultra-fine levels without using large amounts of expensive alloying elements. (Fig.1) Tool steels will be applied to a wide diversity of uses, for example, hot working dies with high strength and softening resistance, cutting tool materials, high strength cold working dies, and hot forging dies with excellent heatresistance, etc. Elevated temperature strength High

[3] Copper Alloys for Electrical and Electronics Devices In line with the downsizing of IT devices, higher reliability of conductive material is required. Moreover, 65 nm and smaller technology nodes are expected for semiconductor manufacturing. Controlling the nano structure of materials, the goal is establishment of a technique to make high strength copper alloy without sacrificing electroconductivity, and reduction of the critical width of copper wiring. Up to now, TS 900MPa and 50%IACS have almost been achieved.



High speed Matrix steel high speed SKH51 steel

ŔŌŅĹ

Objective of this research

Fig.1 Notional illustration of the objective of this research

ŔŌŅĸ ŔŌŅķIJ Hot working tool steels (JIS grade)

Toughness

ŔŌŕĵ High

 Contact Information New Energy and Industrial Technology Development Organization Nanotechnology and Materials Technology Development Dept. Tel: +81-44-520-5220 Osaka Science and Technology Center Tel: +81-6-6443-5326 http://www.ostec.or.jp Japan Research and Development Center for Metals Tel: +81-3-3592-1284 http://www.jrcm.or.jp Hitachi Metals,Ltd. Tel: +81-854-22-1919 http://www.hitachi-metals.co.jp

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Nanotechnology Program

Advanced Nanocarbon Application Project KeywordsᲴNanotube, Fuel cell, LSI wiring R&D TermᲴFY2002᳸FY2005 Budget of FY2005Ჴ1.0 billion yen

Background and Industry) to stimulate the Japanese economy. In the project , two R&D themes are emphasized in particular. The first is to establish electrode material technology for carbon nanohorn on which catalyst is effectively embedded in order to help development of fuel cells used for mobile IT devices such as mobile phones and PCs. The second is to develop application technologies for LSI wiring by applying excellent electric conductivity and mechanical strength inherent to the carbon nanotubes. It is intended to actively apply whatever results gained in this project to various industrial sectors such as the energy sector, IT sector and chemical and environmental sector to advance use of nanocarbon material.

The objective of this project is to develop fundamental technologies for nanocarbon materials such as a single wall carbon nanotube and nanohorn. It is intended to develop mass-production technology by properly controlling specific nano-structure, to develop basic technology to satisfy desired physical and chemical characteristics by way of reprocessing and modification of the produced nanocarbon materials, and to apply IT devices by growing nanocarbon on the substrate under proper control of material properties and orientation. It is also intended to develop nanostructure characterization technologies, which are vital to develop the above fundamental technologies. This project is one of the Focus 21 Projects launched by METI (Ministry of Economy, Trade

Organization Project Leader Dr.S. IIJIMA National Institute of Advanced Industrial Science and Technology Participating Organizations  Japan Fine Ceramic Center National Institute of Advanced Industrial Science and Technology.

Dr. S. IIJIMA

Contents [ Ძ ] Structural Control and Mass Production Technology Mass production and application technology for a multi-wall nanotube is at the stage of commercial consideration. For the single wall nanotube, it is still at the stage of basic research. In this project, we targeted the development of structural control technology and mass production technology in the latter aspect, namely a single wall nanotube and nanohorn as well. By simultaneously developing various technologies such as the fluidized bed method and floating catalyst method to synthesize a single wall nanotube by applying catalyst on hydrocarbon, and the laser ablation method to produce nanohorn without catalyst, it is intended to establish optimum mass production technology as soon as possible and to boost and accelerate development of other application technologies. Through successful establishment of catalyst technology for a fluid bed reactor, we developed synthesizing technology for a single wall nanotube. In the floating catalyst method, we developed technology to continuously synthesize

single wall nanotubes. In addition, we improved recovery efficiency and synthesizing efficiency in nanohorn production.

Single wall nanotube after refine

Equipment to Synthesize Single Wall Nanotube by Floating Catalyst Method

[Წ] Electrode Material Technology for Fuel Cells The capacity of current secondary lithium batteries used for mobile devices has reached the limit. Thus, new next-generation batteries need to be developed. Once nano-carbon material is applied, continuous operation of a note book PC

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can be made possible as long as hydrogen or alcohol is supplied because the energy density of fuel cell is about 10 times greater than that of a lithium secondary batteries. For actual realization of this new battery, we need to clear the hurdle of development of an improved nanocarbon electrode embedded with catalyst. It is nothing more than the development of improved technology in the process of nanodispersion of platinum catalyst and the cost performance. At this point it is known that carbon nanohorn can yield a better result in this respect compared to conventional carbon black materials. It is promising to make a big step toward successful utilization of a nanocarbon battery with increased power output once carbon nanohorn is applied to the electrode of fuel cells in place of conventional carbon black material. We succeeded in prototype production of a fuel cell with compact but higher power capacity used for mobile electronics devices, and proved that such a fuel cell could be practically applied to mobile phones and mobile PCs. Carbo n nanohorn aggregate

Pt catalysts (dark spots) supported on carbon nanohorns

Pt catalysts

Fuel CH3OH

O2

H+

Air

e

Electrode

e

H2O Electrode

e

Proton Exchange Membrane

e

CO2

expected that technology can be developed for a new transistor made of nanotubes. In this R&D, emphasis is placed on the development of LSI wiring that is expected to be complete at a rather early stage. So far, we succeeded in the development of technology to have nanotubes grow at a selected orientation in via holes by means of the chemical vapor deposition (CVD) method.

50nm

㪌㪇㩷㫅㫄㩷 Fuel cartridge (Methanol inlet)

e

e

Schematic drawing of direct methanol fuel cell Internal fuel cell

Prototype of portable notebook PC  with an internal direct methanol fuel cell

 [3] LSI Wiring Technology Carbon nanotubes allow the passage of a huge current density that is about three orders of magnitude more than that of conventional wiring copper metal. This implies that a high performance and highly reliable LSI can be developed if it is applied to wiring material for multi-level interconnections. Further, it is



Cross-sectional Structure of Via Interconnection and  MOSFE

[4] Nanostructure Characterization Technology The ultimate characteristics of the carbon nanotube will be clarified through removal, replacement and addition of certain atoms, and the affected characteristics of nanotubes will be clarified by nanostructure changes will be clarified. Also planned is to analyze and identify the atoms in the structure of nanocarbon material to enable application to devices with higher reliability. It is intended to study nanostructure, tube diameter, length, chirality, shape and behavior of catalyst as well as growth direction and density of nanocarbon materials. It is also intended to disclose useful information such as the difference in chemical bonds before and after gas absorption and the structure and distribution mode of catalyst used for fuel cell application. Further, it is intended to observe the specific interface between nanocarbon material and electrodes and to measure in-situ electric characteristics of a specific nanocarbon material.

 Contact Information New Energy and Industrial Technology Development Organization Nanotechnology and Materials Technology Development Dept. Tel:+81-44-520-5220 National Institute of Advanced Industrial Science and Technology Tel +81-29-861-9417

http://www.aist.go.jp/index_en.html

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Nanotechnology Program

Nanotechnology Particle Project Keywords: Nanoparticles, Functional devices, Electronics & Information. R&D Term: FY2001᳸FY2005

Budget of FY2005:520 million yen

Background Nanoparticles are of interest because their chemical and physical behavior are unprecede nted and different from those in bulk form.  Nanoparticles have great potential for use in electronic, photonic, chemical and mechanical industry and other application.

This project aims at establishing a platform for developing synthesis and functionalization technologies for nanoparticles, which are imp ortant for producing nanostructures and exhibi ting nano-functions.

Organization Project Leader Hiroshima university

Professor K. OKUYAMA Participating Organization

Japan Chemical Innovation Institute

Prof. K. OKUYAMA

Contents such as oxide, magnetic, semiconductor, phosphor and metallic nanoparticles, as basic technology to scale up to industrial production process. A typical example of the quantum size effect is when luminescent spectra from luminescent semiconductor nanoparticles, which can be controlled from the range of blue to red depending on particle size.

[1] Synthesis of Nanoparticles  To establish technology for synthesizing nanoparticles adaptable to the various fields of electronic information, photo-functions and composite materials, we intend to develop the most suitable synthetic method. The techniques used for synthesizing nanoparticles and related targets are summarized in the figures shown below. We will establish synthesis of nanometer sized, uniform and stable particles,

Gas-Phase Synthesis CVD Method Reactive Monomer Chemical Reaction

Liquid-Phase Synthesis Spray Pyrolysis

Micellar Method

Reactive Monomer

Sprayed Droplets

Chemical Reaction

Evaporation

Coagulation

Solidification Monomer Condensation

Monomer Condensation

Clusters

Sol-Gel Method

Targets

Decomposition

Homogeneous Nucleation Dried Particles

Micellar Chemical Reaction

Particle Size :

1䌾10 nm

Distribution With coefficient variation of㩷 10% or less Particle Shape :

With aspect ratio of 10% or less

Sintering Cryst allization

Clusters Chemical Reaction

Nanoparticles

Homogeneous Nucleation

Agglomeration

Micelle

Nanoparticles

Nanoparticles

Nanoparticles

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Production 100 g/h Rate :

or more

[3] Composite of Nanoparticles and Polymer  It is very difficult to mix nanoparticles with resin mechanically and to obtain uniform dispersion of nanoparticles in composites. We intend to develop technology to obtain a uniform dispersion of nanoparticles in the resin by (1) loosening the agglomeration of nanoparticles, and (2) treatment of nanoparticles with organic compounds, etc. Since the size of nanoparticles in the resin is smaller than the wavelength of visible light, the composites or films are transparent in the visible region in the figure shown below. Through the expression of function/properties of nanoparticles and the application of basic technologies, it is possible to create composite materials, that can be used in a wide range of application fields having excellent thermal, electric, mechanical and photo-functional properties.

Photoluminescence of CdSe nanoparticles having different sizes : 2.0nm (blue), 3.5nm (green) and 4.5nm (red). [2] Organization of Nanoparticles We intend to develop technology to fabricate thin film of ordered nanoparticles by arrangement and deposition on substrate. We also intend to develop novel process for arrangement of nanoparticles in the gas phase using the attractive force between charged nanoparticles and counter-charged patterns on the substrate. We aim to achieve high performance nanoparticles for use in different kinds of devices.

200nm 70nm Nanoparticle

70nm Nanoparticle

Line Arrangement

Dot Arrangement

200nm (TEM photograph) (Appearance) (Top) Conventional method (Bottom) Transparent nanocomposite film

Contact Information New Energy and Industrial Technology Development Organization Nanotechnology and Materials Technology Development Dept. Tel:+81-44-520-5220 Japan Chemical Innovation Institute Tel:+81-3-5283-3260

http://www.jcii.or.jp/

8

Nanotechnology Program

Nanostructure Coating Project Keywords:Coating, Microstructure, Energy Budget of FY2005: 310 million yen

R&D Term:FY2001᳸FY2006

Background nano-level, will be developed based on efficient processing techniques, theoretical methods, and rapid and detailed evaluation technology. In addition, the project aims to systemize this technology and establish coating engineering as a field in its own right.

The Nanocoating Project’s aim is to establish technology for coating ceramics onto metallic substrates to act as thermal and environmental barriers, thereby reducing a device’s energy demands and environmental burden. Nanocoatings, i.e., coatings containing particles, pores and interfaces precisely controlled at the

Organization Project Leader Professor T. YOSHIDA University of Tokyo Participating Organizations Japan Fine Ceramic Center National Institute of Advanced Industrial Science and Technology .

Prof. T. YOSHIDA

Contents Ĭ Processing Technology Technology is needed for rapidly producing nanocoatings with nano-level precision. Processing methods in use include Thermal Plasma Spraying (TPS), Physical Vapor Deposition (PV D) and Chemical Vapor Deposition (CVD). TPS enables coatings to be produced rapidly, but controlling the structure at the nano-level is difficult. In contrast, PVD and CVD provide good control over formation of nano-level struc tures, but the deposition rate is low. In this project, TPS methods that allow better nano- level control will be developed alongside high deposition rate PVD and CVD methods. These will form the basic processing technologies for rapid production of nanostructured coatings.

Twin Hybrid Plasma Spraying System

ĭ Technology for the Design and Control of Nanocoating Structures and Properties Materials for thermal barrier and corrosion resistant coatings need to be thermally insulating, possess high thermal stability and be resistant to spalling and oxidation. Currently used coating materials do not possess these characteristics because they consist of coarse, micron-size grains and pores. Consequently, their use in gas turbines is limited to turbine inlet temperatures below 1200㷄.

Electron Beam (EB)-PVD Equipment

9

In order to radically improve the above-mentioned properties, each component of the coating system (top coat, bond coat and substrate) and the interfaces between them need to be contr olled via:

techniques spanning nano- to macro-scales are not yet available. Furthermore,with regards to lifetime prediction, property evaluation and non-destructive testing techniques, most methods are at least partly empirical, and quantitative evaluation and analysis techniques under precise experimental conditions currently do not exist. In this project, therefore, non-destructive techniques based on comprehensive performance analysis and multi-scale computer simulations spanning the nano- to macro-levels are being developed for evaluating dynamic interface properties and predicting the life-time and reliability of nanocoatings.

ȷDesign of optimized structures on the nanometer scale using computer simulation ȷPrecision fabrication of coating structures using the techniques developed in Ĭ above ȷAccurate analysis and evaluation of nanocoating properties This will result in the development of novel coating materials with superior thermal insulation behavior, thermal stability and interface properties (including reduced sintering rates, greater oxidation and spallation resistance, and higher phase stability).

į Systematization of Materials Nanotechnology Based on Interfaces between Different Materials In order to systemize the study of nanotechnology based on the nature of interfaces between different materials, the new field of “coating engineering” will be established, and a coating materials database for use in real applications will be created.

Į Performance Analysis and Evaluation Technology In order to develop nanocoating technology, it is important to know how each component of the coating performs under service conditions. The calculation methods currently available are limited in scale; multi-scale simulation

Development of an EB-PVD Technique for

Microstructure of New TBC System

Coating Functional Perovskite Oxides

Contact Information New Energy and Industrial Technology Development Organization Nanotechnology and Materials Technology Development Dept. Tel:+81-44-520-5220

Japan Fine Ceramics Center Tel:+81-52-871-3500 http://www.jfcc.or.jp/

10

Nanotechnology Program

Synthetic Nanofunction Materials Project    Keywords:Nano-simulation, Molecular-sensor, Spin-electronics, Nanofabrication R&D Term : FY2001᳸FY2005 Budget of FY2005:230 million yen

Background of

design, novel structure-function relationships on the

theoretically-designed nanostructures, and its ultimate

nanometer scale are being explored. Their validity in

goal is the technical establishment of creation of

the frontier fields of spin-electronics and molecular

artificial materials

nanotechnology are also being demonstrated.

This

project

aims

at

the

providing

fabrication

extremely

high

performance. On the basis of a computational material

Organization Project Leader Dr.H. YOKOYAMA National Institute of Advanced Industrial Science and Technology Participating Organizations National Institute of Advanced Industrial Science and Technology SII Nanotechnology Inc. TOHOKU university.

FUJITSU Limited.

SUMITOMO CHEMICAL

OOSAKA university

Dr. H. YOKOYAMA

Current Results [1] SimulationᲠ Molecular Sensor

-Development of nanosimulation technologies-

metal surface to elucidate a mechanism for molecular

On the basis of theoretical modeling and simulation,

self assembly, nanostructure formation in polymer thin

the aim is to predict various novel functions of 10

films, and investigation of an adhesion mechanism

nm-scale

for a peptide molecule on origo ethylene glycol

materials

with

special

emphasis

on

controlling various molecular properties as shown in

self-assembly monolayers,

Figure 1.

subjects in applications of nanotechnology. (Fig. 2)

which are important

(1) A high speed mesh Evald method was developed as an order N method with coulomb interaction for a three-dimensional structure with a two dimensional periodical boundary condition like molecular film on the surface of metal plate. (2) An efficient computational algorithm of molecular dynamics was developed for structural change of a nanomolecule system composed of a partial rigid body with a long relaxation time over several tens of nano

Figure 1. Multi-time step integrator for a semi-flexible

seconds.

model Target molecule

(3) A coarse-grained particle model and dissipative

e-

particle dynamics method was developed to calculate molecular interaction of nanostructures.

S

S

-Application research on nanostructuresThe above nanosimulation methods were applied to

Figure 2.Molecular sensor bridged between electrodes

structure the prediction of monomolecular layers on a

placed at nanoscale distance

11

[2] Spin Electronics

compared to conventional lithography methods. This

Hard disk drive (HDD) capacity has remarkably

technique can push the limit of miniaturization. The

increased using a giant magneto-resistance effect used

final goal of this project is fabrication of patterns

spin polarized current in which polarized current plays

consisting of 10 nm wide lines within a 10 mm area

the crucial role. Thus, electron spin has the potential

with an accuracy of 1 nm. (Fig. 4)

of opening the door to new devices not previously possible, and semiconductor spin is a hot topic in the spintronics (spin electronics) field. In this research, new nanostructures that exhibit the world largest magneto-resistance effect at room temperature have been successfully fabricated. (Fig.3) The material in the nature of 100 % spin polarized at the Fermi level is called as a half metallic ferromagnet. If it becomes possible to use such material for a Figure 4. AFM image of an oxide lattice on Si surface

magnetic sensor and magnetic random access memory ( MRAM )

with

magnetic

tunnel

( line width of 15 nm and spacing of 100 nm)

junctions,

performance will be remarkably improved. Theoretical predictions of half-metallic material were

In order to evaluate the relationship between function

made using ab-initio calculations, and attempts were

and structure of nanostructured material, a “laser

made to synthesize the predicted materials using

nano-prototyping” process was developed (Fig. 5).

molecular-beam epitaxy.

Monodispersed magnetic core-shell nanoparticles are synthesized by laser ablation and a size classification technique aimed at magnetic nanoparticles is expected to be used for ultra-high-density magnetic recording media.

Figure 3. Magnetic resistance switch device

 [3] Nanomanufacturing Technology

Figure 5. Laser nanoprototyping technology

Anodic oxidation using a scanning probe microscope offers convenient and on-demand nanofabrication

Contact Information New Energy and Industrial Technology Development Organization Nanotechnology and Materials Technology Development Dept. Tel:+81-44-520-5220 National Institute of Advanced Industrial Science and Technology

Tel. +81-29-861-9417 http://www.aist.go.jp/

12

Nanotechnology Program

Nanotechnology Material Metrology Project Keywords: Nanoparticle, Nanopore, Surface, Thin film, Thermophysical property, Reference material R&D Term: FY2001㨪FY2007 Budget of FY2005: 210 million yen

Background range for various measurements commonly used across different technical fields and for facilitating the dissemination of the results of nano R&D to the manufacturing sector.

The Nanotechnology Material Metrology Project will provide a definite solution, by developing the nanoscopic measurement standards, to assure any results of measurement in the nanoscopic

Organization Project Leader Dr.M. TANAKA National Institute of Advanced Industrial Science and Technology Participating Organizations National Institute of Advanced Industrial Science and Technology Japan Fine Ceramic Center Dr. M. TANAKA

Contents Fine particles There is a need to accurately evaluate nanoparticles as a building block of nano structure, as well as fine particles, for the purpose of quality management of semiconductors, environmental control of exhaust gases and so on. One of the key technologies to attain this objective is to supply accurate reference material for particle diameter. AIST has been supplying the world’s most precise standards for a particle diameter of 100 nm and is currently striving to develop nanoparticle reference material for a range of even smaller diameter. In this project, practical application of a new technique for measuring the mass of fine particles is being pursued using the equilibrium between centrifugal force and electrostatic force both working in on particles. In the field of polymer materials, the diffusion coefficient of polymers and nanoparticles in solution is measured with precision using dynamic light scattering and nuclear magnetic resonance, and the average particle diameter is determined. Furthermore, scattering pattern measurement is being conducted on samples separated by size exclusion using multiangle laser light scattering (MALLS), leading to the establishment of a technique to accurately measure particle distribution.

Principle of a Method for Aerosol Particle Mass Analysis Nanopores Porous materials with nanopores of a few nanometer diameter are attracting attention as low-k dielectrics for the wiring system of next generation semiconductor devices. In order to measure such nanopores, the development of a positron annihilation method will provide information regarding both the average size and size distribution of nanopores by calculating positron lifetime based on the energy distribution of gamma rays generated by position annihilated in the samples, which is found in nanopores having sub-nm to 10 nm material scale. There is also a need to measure the period of gamma ray emission.

13

In this collaboration project with the Photonics Research Institute, a popular-type compact-size positron lifetime spectrometer that utilizes a positron beam obtainable from a radioisotope is being developed.

X-ray

e-

A thin film sample on the holder Thermophysical Properties Thermophysical properties of thin films such as thermal diffusivity, specific heat capacity, thermal conductivity and thermal expansion coefficient are indispensable in terms of thermal and structural designing. In this project, the thermal change on the reverse side of thin film is being observed referring to the change of reflectance to a laser beam, by heating the film surface using a pico-second laser (the pico-second thermoreflectance technique). Measurement technology will thus be created for the thermal diffusivity of thin films and the coating material, boundary thermal resistance between thin films, and boundary thermal resistance between the coating and the base material. By means of a laser interferometer, technology to accurately measure the coefficient of thermal expansion of solid materials will be established.

Compact-size Positron Lifetime Spectrometer Surface Structure X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used as the means of characterization of surface composition, electronic state, etc. of materials that have functional surfaces, such as thin films, catalysts, sensing devices and so on. The target of the project is development of tunable photoelectron spectroscopy technology with synchrotron orbit radiation as an excitation source. Also, the objective is the establishment of quantitative reliability of conventional XPS and AES excited by KD-ray of Mg and Al. In addition, a database for surface analysis is to be constructed based on the collection of a standard spectrum of samples whose physical and chemical change is kept to the minimum. A technique to eliminate background distortion of spectrum causes by inelastic scattering of photoelectrons is also a subject of the study.

Illustration of the Picosecond Thermoreflectance Measurement System

Contact Information New Energy and Industrial Technology Development Organization Nanotechnology and Materials Technology Development Dept. Tel:+81-44-520-5220 National Institute of Advanced Industrial Science and Technology Tel +81-29-861-4394 http://www.aist.go.jp/index_en.html

14

Nanotechnology Program

Project on Nanostructured Polymeric Materials Keywords: Polymer, Nano-scaled interface structure control R&D Term: FY2001᳸FY2007 Budget of FY2005: 630 million yen

Introduction This research project aims at achieving a

higher-order structures of polymers. Ultimately,

“quantum leap” in the attainment of high

the objective is to contribute to the establishment

functional

polymer

of new materials and a technology system capable

materials and of environmental compatibility,

of supporting a wide range of application fields in

and its purpose is to establish a technological

the field of energy conservation.

performance

of

organic

basis for precise control of the primary and

Organization Project Leader  Dr.S NAKAHAMA National Institute of Advanced Industrial Science and Technology Participating Organizations Japan Chemical Innovation Institute.

Polymatech co,. LTD. ULVAC, Inc.

National Institute of Advanced Industrial Science and Technology Dr. S. NAKAHAMA

Contents [1] Packaging Materials

[2] Nano-Composite Materials

 High performance ultra-thin diebond films for a

A novel polyphenylene ether/ poly(ethylene-co-

semiconductor package are being developed to

glycidylmethacrylate) (PPE/EGMA) nano alloy

meet demand

for packaging materials having

higher reliability for downsizing of electronics devices. 㪪㫀㫃㫀㪺㫆㫅㩷㪻㫀㪼㩷

㪛㫀㪼㪹㫆㫅㪻㩷㪽㫀㫃㫄㩷

㪪㫋㫉㫌㪺㫋㫌㫉㪼㩷㫆㪽㩷㫊㪼㫄㫀㪺㫆㫅㪻㫌㪺㫋㫆㫉㩷㫇㪸㪺㫂㪸㪾㪼㩷

 Acrylic rubber/epoxy resin alloy film with a 20nm periodic distance was successfully obtained by curing with an imidazole compound to fix spinodal decomposition at the early stage. This film showed higher tensile strength and lower

was obtained by reactive blending with a long

thermal expansion than conventional film at 1μm,

(L/D=100) twin screw extruder. This nano alloy

which suggests the possibility of its application

has excellent processability and properties such

for packaging material.

as strength, heat resistance and insulation performance. This material was observed using the 3D-TEM under development in this project to visualize its stereoscopic morphology.

15

㪫㪜㪤㩷㫀㫄㪸㪾㪼㩷㫆㪽㩷㪧㪧㪜㩷㫅㪸㫅㫆㩷 㩷 㪸㫃㫃㫆㫐㩷

㪊㪛㪄㪫㪜㪤㩷 㫀㫄㪸㪾㪼㩷 㫆㪽㩷 㪼㫋㪿㫐㫃㪼㫅㪼㪄 㪼㫇㫆㫏㫐㩷 㪺㫆㫇㫆㫃㫐㫄㪼㫉㩷 㪻㫆㫄㪸㫀㫅㩷 㫀㫅 㪧㪧㪜㩷㫅㪸㫅㫆㩷㪸㫃㫃㫆㫐㩷

[3] Halogen-Free Materials  A halogen-free flame retardant material with high flexibility, high strength and recyclability was

successfully

vulcanization rubber

of

developed an

by

dynamic

ethylene-propylene-diene

(EPDM)/polyethylene

[5] Nanostructure Analysis Technology

(PE)/Mg(OH)2

ternary system as shown below. This material can

 Scanning viscoelasticity microscopy (SVM) was

be used for insulation or the sheath of power

developed to precisely evaluate surface nano

supply cables, replacing PVC.

mechanical properties. Quantitative evaluation of surface elastic properties for glassy polymers was achieved to estimate surface glass transition temperature (Tg) at surface, 40é lower than the Tg of bulk as shown below.

[4] High-Strength Fibers  Melt spinning with laser irradiation was found to be effective in controling the structure of polymer chain entanglement, and followed by drawing and annealing of as-spun fibers, the strength of PET fibers successfully achieved

[6] Shared Technology Platform

1.4GPa. Such high-strength fibers are expected to

 Review articles concerning research subjects,

be applied for tire cord.

including some R&D achievements of this project, were

published

“Nanostructured

as

a

Polymeric

book

entitled

Materials

and

Technologies” in order to promote a wide range of knowledge concerning polymer nanotechnology.

Contact Information New Energy and Industrial Technology Development Organization Nanotechnology and Materials Technology Development Dept. Tel:+81-44-520-5220

Japan Chemical Innovation Institute. Tel: +81-3-5283-3260 http://www.jcii.or.jp/

16

Nanotechnology Program

Advanced Nanofabrication Process Technology Using Quantum Beams Keywords: Cluster ionŴNo-damage nano-processing, High-speed and precise nanoprocessing            R&D TermᲴFY2002᳸FY2006 Budget of FY2005Ჴ260million yen

Background Advanced quantum beam process technology, which employs gas cluster ion beams and high-brightness synchrotron radiation, has considerable potential for material processing and analysis in nanotechnology. Especially, the cluster ion beam process, which uses irradiation of energetic aggregates of atomic or molecular gas, has opened a new field in material processing. Cluster ion beam technology originated in Japan from extensions of ion beam technology developed over the last 100 years. In advanced quantum beam process technology, low-energy irradiation and lateral sputtering effects are applied towards a ‘no-damage nanofabrication’ process. Also, enhanced chemical reactions due to dense energy deposition by cluster ion beam irradiation are employed to develop high-speed

and precise nanoprocessing technology. In this project, nanoprocessing techniques for various semiconductor, magnetic and compound materials are being developed with advanced quantum beam technology.

Organization Project Leader Professor I. YAMADA Kyoto university Participating Organization Osaka Science & Technology Center

Prof. I. YAMADA

Contents Basic Technologies It is important to optimize the cluster species, cluster size or the ion energy of cluster ion beams for industrial applications of advanced quantum beams. In the basic technology development program, high size-controlled cluster ion beams were formed and reactive cluster ions having high-energy were irradiated to obtain fundamental characteristics. To analyze interactions between cluster ions and target atoms, large-scale molecular dynamics simulations and Monte Carlo simulations were performed. Also, high-brightness synchrotron radiation facilities such as SPring-8 were used to study ion induced damage at the nanometer level.

 Cluster size control and   Harima Science Garden City irradiation system        SPring-8

17

No-damage Nanoprocessing Technology Magnetic devices are constructed using ultra-thin films, and technology that realizes nanometer order processing is required. In pacticular, surface damage and roughness are crucial factors that dominate device characteristics. In this project, the goal is development of nanoprocessing technology for magnetic materials. Therefore, a practical no-damage, ultra-smooth nanoprocessing method aiming at both surface roughness and sub-surface damage depth below 1nm will be developed. Also, because of the high sensitivity of materials to radiation damage, development of large area processing of compound semiconductor wafers is needed. In this research project, 6 inch or large SiC wafers are being processed with advanced quantum beams, a task that is difficult to achieve with

 No-damage Nanoprocessing Technology

  Magnetic devices

 SiC wafers

conventional processing. High-speed and Precise Nanoprocessing Technology High-speed etching of semiconductors is needed to obtain photonic crystals and large area thin film devices. In this research project, reactive and high-energy cluster ions are employed for the surface processing of polycrystalline Si with surface roughness below 2nm for high-speed thin film display devices. In addition, high-speed etching of Si for photonic applications is being developed. This technology will have an etching rate higher than 10Œm/min for patterns below 100nm

 High-speed and Precise Nanoprocessing Technology

 Photonic Crystal

dimension and an aspect ratio between 1 to 20.

Contact Information New Energy and Industrial Technology Development Organization Machinery System Technology Development Department Tel: +81-44-520-5241 Osaka Science & Technology Center

Tel: +81-6-6443-5322 http://www.ostec.or.jp/

18



Next-generation FPD

Nanotechnology Program

Full Color Rewritable Paper Using Functional Capsules Project

Keyword: Electrophoresis, Capsule, Rewritable paper R&D Term: FY2002᳸FY2005

Budget of FY2005: 360 million yen

Background information

The goal of this project is to develop new

media

such

as

newspapers,

display material for an electrophoretic display

magazines, books, posters etc. can be used

that enables control of electrically charged colored

repeatedly. It will also be possible to access

nanoparticles dispersed in solvent. The paper-like

information without feeling uncomfortable as a

reflective design is the remarkable characteristic

paper culture has existed for over 5000 years. By

of this display compared to emissive displays such

of

paper

becomes

results

of

this

project,

proposed and new markets for content can be

Not to use a light source becomes energy saving. substitution

the

protection of finite forest resources can be

as cathode-ray tube,EL and plasma displays. If

applying

developed in the future.

possible,

Organization Project Leader Professor T. KITAMURA.

Chiba University

Participating Organization Japan Chemical Innovation Institute

Prof. T. KITAMURA

Contents Basic technology for full color rewritable paper roughly consists of the following. [1] Encapsulation Technology Capsule technology derived from non-carbon paper has many applications, such as wrapping technology for food, medical supplies, chemicals, liquids, powders and gases. Based on such materials, encapsulation types, capsule materials and capsule structure have been examined.

emulsifying method, etc. have been examined,

In this project, with the purpose of making a

and a capsule of 10-60 micrometer average

capsule that includes dispersion liquid, various

particle diameter with 10% or less of CV values

techniques

separation,

was successfully manufactured. Furthermore, by

coacervation,

means of capsule design, wall thickness control

interfacial

related

to

phase

polymerization,

solvent-extraction,

phase

inversion

and

and

interfacial radical polymerization have been

formulation

technology

development,

practical capsule design was attained.

examined. Moreover, in order to obtain a monodispersed capsule, the IJ method, SPG film

19

a

[2] Nano Functional Particle Surface Physical

[3] Development of Picture Display Material and

Property Control Technology

Functional

Technology to disperse and electrically charge

and

a

particles as the display material, an electrode for

To create coloring particles, various techniques solvent

polymerization,

Using

To use a capsule that includes nanofunctional

been developed. as

Technology

Capsule

nano-sized colored particles in organic solvent has

such

Evaluation

evaporation,

emulsification

suspension

control and arrangement of capsules is necessary.

dispersion

Moreover, to make a flexible display device model,

polymerization

the electrode and transistor for control must be

polymerization

are

flexible, and organic semiconductor material is a

being

promising possibility.

examined.

As preparation for realizing flexible rewritable

Key points to achieve This technology are controlling morphology, diameter and distribution,

paper

electric charge († potential), dispersion stability,

electrodepattering

material design and formulation of material.

semiconductor forming is being carried out.

Investigation

of

technology

wet and

process organic

Technology for two-dimensional arrangement is being investigated using a method to transfer, print and electrodeposit materials in order to achieve color display.

㪮㪼㫋㩷 㫇㫉㫆㪺㪼㫊㫊㩷 㫇㪸㫋㫋㪼㫉㫅㫀㫅㪾㩷 㩷

Particle Model and Created Particles

㪼㫃㪼㪺㫋㫉㫆㪻㪼㩷

Transparent

䋱㱘䌭

Colored

㪤㫆㫅㫆㪻㫀㫊㫇㪼㫉㫊㪼㪻㩷㪧㪸㫉㫋㫀㪺㫃㪼㫊㩷㪬㫊㫀㫅㪾㩷㪤㪸㪺㫉㫆㫄㫆㫅㫆㫄㪼㫉㫊㩷

Furthermore, to control the interaction of

㪰㪤㪚㩷㪺㫆㫃㫆㫉㫀㫅㪾㩷㫌㫊㫀㫅㪾㩷㪜㪚㩷㫄㪸㫋㪼㫉㫀㪸㫃㫊

nanoparticles and capsule walls, analysis of

Moreover, for color expression, examinations of

particles and polymer film is being conducted.

electrochromic

111

[-] [-]

0.6 0.6

⚥ⓍಽᏓ ⚥ⓍಽᏓ

0.4 0.4

Retrace key ke

00

20 20

40 40 40

well

as

the

Recently, a reflective type display has gradually

0.2 0.2

00

as

electrophoresis method are being conducted.

Surface treatment weakens adhesion force

0.8 0.8

material

60 60 60

80 80 80

Additive conc. additi e Without ith t Dispersant Dispersant coCoupling pling agent

been

Colloid probe

proven

to

be

practical,

and

an

electrophoretic display is one of the most

[mg/m22 ] [ ---/ ] 18.9 0.500 0.379 agent

paper-like methods. Research to establish basic technology,

especially

for

whiteness

background, high resolution to satisfy

-3

of the

complicated character expression of Japanese and

-3 -3 100x10 100x10 100x10

ઃ⌕ജ [nN/nm] ઃ⌕ജ [nN/nm]

generating color, etc. is being conducted in this

Change of Adhesion Force between Particle and Film



area.

Contact Information New Energy and Industrial Technology Development Organization Nanotechnology and Materials Technology Development Dept. Tel:+81-44-520-5220 Japan Chemical Innovation Institute Tel +81-3-5283-3260 http://www.jcii.or.jp/

20

Nanotechnology Program

Nanostructure Forming for Ceramics Integration Project  Keywords: Ceramics, Nano crystal, Iinformation and telecommunications R&D Term:FY2002㨪FY2006 Budget of FY2005:250 million yen

Background This project, pursuing the unique aerosol deposition method (AD method) originally developed in Japan as a core technology, has aims at a significant reduction in the process temperature, miniaturization and high densification of materials. From the viewpoint of manufacturing technology, combining metals, glasses and plastics at the nanoscale permits integration at the component level. An innovative low temperature integration technology for advanced ceramic materials has been developed

to significantly improve the function of finished components. The purpose of this project is through the exercise of attained achievements, ro enable Japan’s ceramics industry to create advanced products that will lead the world markets in the fields of information, communication, energy and environment technologies, resulting in enhanced international competitiveness as well as contributing to society through new market developments.

Organization Project Leader Dr.J AKEDO. National Institute of Advanced Industrial Science and Technology Participating Organizations National Institute of Advanced Industrial Science and Technology Manufacturing Science and Technology Center Brother Industries, Ltd. TOTO LTD. FUJITSU Limited. NEC Corporation Sony Corporation. NEC TOKIN Corporation

Dr. J. AKEDO

Contents [1] Process Research and Development ɔ Compaction of nano-sized ceramics at room temperature ɔ The AD method is a film deposition technology where the impact of solid state particles can create a strongly adherent, high-density nano crystalline ceramic film by gas blasting nano sized ceramic particles onto a surface. The deposition rate is 30 times faster than that obtained with conventional thin film technology and the ceramic thin film can be deposited at room temperature. Initially, a new ceramics film creation mechanism “rroom-temperature-shock- compaction-phenomenon” was investigated. It was discovered that the material particles were fractured and deformed into nano crystallite-sized particles of 10 to 30 nm and formed dense nano crystal structures on impact with the substrate, with the activation of the newly formed surfaces on collision of particles dominating the inter-particle bonding. Based on the above deposition model, the optimum deposition condition was calibrated, and ǂ-Al2O3 nano particles were successfully compacted at room temperature a world first, achieving electromechanical properties equal to those of sintered ceramics. Furthermore, the dielectric breakdown strength of this ceramic thick film was a single digit greater (150 – 300 kV/mm) than in sintered ceramics. It was also confirmed that the plasma corrosion resistance and uniformity were superior to sintered ceramics due to the absence of pores. Uniform deposition was achieved over a 200 mm square area. This process represents a technological breakthrough,

21

Wide area 㱍-Al2O3 layer deposited on metal substrate at room temperature using “roomᏱ᷷ⴣ᠄࿕ൻ⃻⽎䭡೑↪䬦䬮㊄ዻၮ᧼਄䭇䬽 ᄢ㕙Ⓧ䕙䯹䰍䰸䎕䰛䎖⤑䬽ቶ᷷ᒻᚑ temperature-shock-compaction-phenomenon”

䮑䮕⚿᥏⚵❱structure Nanocrystal

㪋㪇㫅㫄

in as much as wide ranging applications are anticipated, such as the use of moderately priced raw material particles, currently used for ceramic processing, to form nano structured ceramic films, although the conventional sintering process of over 1000 oC is not required while achieving the hardness and density equal to ceramics sintered in bulk at high temperatures. ɔ Upgrading process technology ɔ Whereas ceramic films possessing the hardness and density equal to sintered ceramics can be deposited at room temperature using the AD method, the electrical properties, including ferroelectric and ferromagnetic, essential to their application to electronic devices, are inadequate due to their sensitivity to the nano structure of the films. Improvement in the properties of the primary particles has been achieved with the assistance of different energy sources, including laser, plasma and high-energy beams as well as modifications to the primary particles themselves. [2] Application Development of Devices

been fabricated by depositing BaTiO3 ferroelectric materials onto a Cu substrate using the AD method. A capacitance of more than 3 nF/mm2 was achieved, far greater than the competitive technology of ceramics/polymer composite, films. This technology has yielded the worlds highest performance for a capacitor fabricated at process temperatures of less than 300 oC. Additionally, electro magnetic interference (EMI) wave absorbers and millimeter-wave imaging sensors are currently under development.

ɔ Piezoelectric devices ɔ Using piezoelectric materials, applications to microdevices such as MEMS optical scanners, ink jet heads and microgyroscopes have all been discussed. In this project, an optical micro scanner having high-speed performance with a resonance frequency of over 30 kHz in atmospheric ambient was successfully fabricated by depositing piezoelectric materials at a high rate onto the scanner structure, fabricated by Si-micromachining via the AD method. This type of high-speed scanning optical scanner is as anticipated to be a key component for use in various types of sensors or next-generation display devices.

LLSI⚛ሶ S I

Capacitor 䉨䊞䊌䉲䉺 䊐䉞䊦䉺 Filter 䉣䉝䊨䉹䊦 䊂䊘䉳䉲䊢䊮⤑

Piezo-driven M O SLM 䎤䎧ᴺ䭡↪䬓䬮࿶㔚㚟േ䎰䎲䎶䎯䎰 ADᴺ䉕೑↪䈚䈢࿶㔚㚟േဳMOSLM form ed by AD m ethod

࿶㔚㚟േ䎰䎨䎰䎶శ䮀䭴䮪䮑䯃 optical micro Package of optical micro scannerscanner

䊒䊥䊮䊃ၮ᧼䋨㪝㪩㪋䋩਄䈮㪘㪛ᴺ Endiveted capacitor formed on 㪝㪩㪋਄䈮ᒻᚑ䈚䈢䉨䊞䊌䉲䉺 circuit 䈪ᒻᚑ䈚䈢䉨䊞䊌䉲䉺 board (FR4) by AD method

㪫㪼㪺㪿㫅㫀㪺㪸㫃㩷㫇㫆㫀㫅㫋㩷㪑 ᛛⴚ䈱䊘䉟䊮䊃䋺 ᓥ᧪䉋䉍ෘ䈇䌓䌩 㪟㫀㪾㪿㩷㫊㫇㪼㪼㪻㩷 ᭴ㅧ䋬䌐䌚䌔⤑䈪 㫊㪺㪸㫅㫅㫀㫅㪾㩷㫉㪼㪸㫃㫀㫑㪼㪻㩷 㜞೰ᕈ䊶㜞ㅦᔕ 㪹㫐㩷㫋㪿㫀㪺㫂㩷㪪㫀 㪸㫅㪻㩷 ╵䉕ታ⃻ 㪧㪱㪫㩷㫊㫋㫉㫌㪺㫋㫌㫉㪼

㔚࿶ශട೨

Initial

Upper electrode

ɔ Optical devices ɔ With the anticipated requirement of ultra-high speed integrated optical circuits to cope with the need for high-capacity information processes, the development of an ultra-high speed optical modulator has been studied. Using the AD method, PLZT electrooptic materials have been successfully deposited onto a glass substrate at a process temperature 100oC lower than conventional processing temperature. A transparent film with an electrooptical constant (rc) of 102 pm/V was successfully obtained, being twice the generally accepted value and five or six times larger than that of single crystal LiNBO3, again denoting the world’s highest performance. A Fabry-Perot type of optical modulator using this film is also being produced.

㔚࿶ශടᓟ

Applied voltage

v-MOSLM䈱ᢿ㕙࿑

Reflection mirror

Magnet-optical layer ⏛᳇శቇጀ

࿶㔚⤑

H PZT cantilever

SGGGၮ᧼

P Z T la y e r

Heff

㔚࿶ශട Cross section of v-MOSLM ೋᦼ⁁ᘒ

Furthermore, processing has continued, aiming at realization of 3D-projector and holographic memories, the development of fast response spatial light modulators, in place of liquid crystal. Capitalizing on the advantages of the AD method, such as a lower process temperature and a high deposition rate, PZT-MOSLM ާPZT-Magneto-Optic Spatial Light Modulators) have also been prototyped, integrating the smart structure, incorporating a piezoelectric thick film with magneto-optic materials. Successful pixel switching at 20 MHz has already been achieved with an 8V drive voltage.

E O -th in film w ith

EO-modulator 䌅䌏ᄌ⺞⚛ሶ

ㅘ᣿䎳䎽䎷⤑ Transparent PZT layer

ɔ High frequency devices ɔ With increasing CPU speed and higher communication frequencies, surface mounting technology has reached its limit in the development of the high-frequency devices in the GHz band. In order to address this problem, highly accurate fine-scale integration of the dielectric, magnetic and metallic materials is required and further miniaturization and high-performance devices having reduced weight are needed. In this research, an embedded capacitor structure has

p e rfo rm a n c e in th e w o rld ਎⇇ᦨ㜞ᕈ⢻䈱䌅䌏⭯⤑ ਎⇇ᦨ㜞ᕈ⢻䈱䌅䌏⭯⤑ 㱐䂦䌮 Relative Change of Refractive Index 㱐䂦䌮 Relative Change of Refractive Index

High speed piezoelectoric

Antenna 䉝䊮䊁䊅

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